Cathode Current Density Distributions in High Power Impulse and Direct Current Magnetron Sputtering Modes
نویسندگان
چکیده
منابع مشابه
Low-temperature growth of boron carbide coatings by direct current magnetron sputtering and high-power impulse magnetron sputtering
access at Springerlink.com ABSTRACT B4C coatings for B-based neutron detector applications were deposited using high-power impulse magnetron sputtering (HiPIMS) and direct current magnetron sputtering (DCMS) processes. The coatings were deposited on Si(001) as well as on flat and macrostructured (grooved) Al blades in an industrial coating unit using B4C compound targets in Ar. The HiPIMS and D...
متن کاملHigh power impulse magnetron sputtering discharge
J. T. Gudmundsson, N. Brenning, Daniel Lundin and Ulf Helmersson, High power impulse magnetron sputtering discharge, 2012, Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, (30), 030801. http://dx.doi.org/10.1116/1.3691832 Copyright: American Vacuum Society, This article may be downloaded for personal use only. Any other use requires prior permission of the author and the ...
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A simple and cost effective approach to stabilize the sputtering process in the transition zone during reactive high-power impulse magnetron sputtering (HiPIMS) is proposed. The method is based on real-time monitoring and control of the discharge current waveforms. To stabilize the process conditions at a given set point, a feedback control system was implemented that automatically regulates th...
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.....................................................................................................I PREFACE.......................................................................................................III PAPERS INCLUDED IN THE THESIS ........................................................... V RELATED PUBLICATIONS NOT INCLUDED IN THE THESIS.................... VI ACKNOWLEDGEMENTS ...
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ژورنال
عنوان ژورنال: Plasma Processes and Polymers
سال: 2009
ISSN: 1612-8850
DOI: 10.1002/ppap.200931201